Dichotomous Image Segmentation (DIS) tasks require highly precise annotations, and traditional dataset creation methods are labor intensive, costly, and require extensive domain expertise. Although using synthetic data for DIS is a promising solution to these challenges, current generative models and techniques struggle with the issues of scene deviations, noise-induced errors, and limited training sample variability. To address these issues, we introduce a novel approach, MaskFactory, which provides a scalable solution for generating diverse and precise datasets, markedly reducing preparation time and costs. We first introduce a general mask editing method that combines rigid and non-rigid editing techniques to generate high-quality synthetic masks. Specially, rigid editing leverages geometric priors from diffusion models to achieve precise viewpoint transformations under zero-shot conditions, while non-rigid editing employs adversarial training and self-attention mechanisms for complex, topologically consistent modifications. Then, we generate pairs of high-resolution image and accurate segmentation mask using a multi-conditional control generation method. Finally, our experiments on the widely-used DIS5K dataset benchmark demonstrate superior performance in quality and efficiency compared to existing methods. Codes will be publicly available.